The sol-gel method from film-forming solutions based on tetraethoxysilane and phosphoric acid solutions, with the addition of calcium and sodium salts, thin structured films were obtained in SiO 2 - P 2 O 5 - CaO - (Na 2 O) at mass content,%: 10-85 SiO 2 , 5-40 Р 2 O 5 , 10-50 CaO, 10 Na 2 O.
The physicochemical processes in solutions, which cause the transition of true solutions to colloidal ones through successive states of sol and gel, have been studied. The criterion of the film-forming ability - the viscosity of solutions - was established, and the critical value of the viscosity for obtaining high-quality films was determined. The formation of oxide systems in the films occurs during firing up to a temperature of 600 ° C. The structure of the films was investigated by infrared spectroscopy, atomic force microscopy, and X-ray phase analysis. The surface of the films obtained is characterized by a developed relief and porosity, which allows one to expect high adhesion properties of the surface. The thickness of the films obtained does not exceed 90 nm. Tab. 1, ill. 5, bibliography: 6 titles.
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