Formation of metallic pattern in the surface layer of glass

The principles of creating thin metal patterns in the surface layer of glass with a resolution of 10 microns using the methods of contact and explosive photolithography are presented. The possibility of using this technology in the production of metal photomasks for micro- and optoelectronics without the use of labor-intensive operations that are currently used, as well as letter and digital images of any size and configuration, is shown.