Modeling of the processes in the oxide-silicate systems under the effect of plasma aimed at quality improvement

Modeling of high-temperature processes occurring in oxide-silicate systems under the influence of plasma has been carried out. The studies were carried out using plasmatrons used in the practice of analytical chemistry in the implementation of atomic emission analysis. The choice of these sources is due to a simpler methodology for studying the interaction of plasma with the surface of a solid material. To clarify the identified high-temperature mechanisms, thermodynamic modeling was carried out using the "Astra" software package. Tab. 2, ill. 5, bibliography: 4 titles.