The work is devoted to the creation of a technology for the formation of the required microrelief of optical surfaces of glass-ceramic substrates. The solution of the problem is shown using controlled local deposition of silicon dioxide on the surface of coatings by laser pyrolysis of tetraethoxysilane vapor in the presence of ozone. The characteristics of experimental samples, their comparison with the data of mathematical modeling of the results of technological processes are presented. The possibility of using the developed technology for profiling substrates with large radii of curvature for the subsequent deposition of multilayer coatings of interference spherical mirrors is shown.
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